TECH NEWS
ASML and TSMC want bigger masks for smaller chips
Industry push aims to eliminate stitching constraints and ready high-NA EUV systems for production by 2033 ASML and chipmaking giant TSMC have launched an industry-wide push toward 12-inch photomasks, saying the larger format could lower costs and overcome some limitations of high-NA EUV lithography. Dutch firm ASML, the only commercial