TECH NEWS
Intel Foundry And ASML Pass 1 Million Wafers On High-NA EUV Lithography
At this week's SPIE Photomask Technology + EUV Lithography conference in Monterey, Intel Foundry and ASML presented a status update regarding the commercialization and high-volume manufacturing (HVM) deployment of High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) lithography. The announcement centers on the news that Intel Foundry and ASML have